The wastewater treatment plan for the Honam Semiconductor National Industrial Complex has been established.
To manage the anticipated daily discharge of 500,000 tons of wastewater, the existing public wastewater treatment facilities will be expanded.
According to Gwangju, the Honam Semiconductor National Industrial Complex is expected to use 650,000 tons of water daily based on the operation of Fab 4, resulting in an estimated wastewater discharge of 500,000 tons.
This figure is based on a wastewater conversion rate of 77% for the semiconductor industry.
Companies will handle the initial treatment of specific substances such as copper, fluoride, and ammonia, which require separate processing based on the characteristics of each fab.
After initial treatment, the discharged wastewater will be processed at public facilities to meet various legal water quality standards before being released into the Yeongsan River, adjacent to the fabs.
Gwangju plans to gradually expand public wastewater treatment facilities according to the operational phases of the fabs.
Initially, a basic plan for a facility capable of treating 320,000 tons of wastewater per day will be established by April next year.
The first wastewater treatment facility is scheduled for completion by December 2029.
It is expected that the facility will be able to handle wastewater until the first half of 2031, when the expansion of at least two additional fabs is anticipated.
Following the expansion of the fabs, an additional 180,000 tons of daily wastewater will be managed through further facility expansions.
* This article has been translated by AI.
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